Categories Research article Thermomechanical Response Model on a Reflection Photothermal Diffusion Waves (RPTD) for Semiconductor Medium Post author By vlad.ilie Post date May 22, 2022 No Comments on Thermomechanical Response Model on a Reflection Photothermal Diffusion Waves (RPTD) for Semiconductor Medium ← Enrichment of elements in industrial waste incineration bottom ashes obtained from three different types of incinerators, as studied by ICP-AES and ICP-MS → Microwave modification of cobalt supported on beta silicon carbide catalyst for Fischer–Tropsch synthesis Leave a Reply Cancel replyYour email address will not be published. Required fields are marked *Comment * Name * Email * Website Save my name, email, and website in this browser for the next time I comment. Δ
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